Monitoring and control領(lǐng) the level of trace element impurities in metals and alloys is important, as impurities can affect the properties of the metal and may degrade the functionality of the finished component. ICP-OES is commonly used for the routine measurement of trace elements in metal samples because of its multi-element capability and tolerance of the high matrix level present in metal sample digests. However, the development of high purity metals and higher-performance alloys requires stricter control of a wider range of trace elements at lower concentrations, so a technique with lower detection limits than ICP-OES is required. ICP-MS offers low detection limits for the elements of interest, but the technique has not previously been considered suitable for the analysis of high matrix samples such as metal digests. For example, conventional ICP-MS instruments may suffer from signal suppression and/or long-term signal drift due to matrix deposition on the interface cones, which affects the signal stability and the accuracy of the analytical results. To overcome this limitation, Agilents Ultra High Matrix Introduction (UHMI) aerosol dilution technology has been developed to allow the Agilent 7900 電感耦合等離子體質(zhì)譜儀