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儀器網(wǎng)/ 應用方案/ Nanoindentation, microscratch, friction and wear stu
  • Nanoindentation, microscratch, friction and wear stu

    更新于:2007-07-12
    應用行業(yè): 建材/家具 人造板材   

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A nanoscale monolithic slider-suspension produced by photolithography is used for contact recording. The contact pad consists of a multilayered structure consisting of Sic, amorphous hydrogenated carbon (a-C:H), AlzOs, Si, and Co-Nb-Zr films. In this study, we have compared hardness, Youngs modulus of elasticity, and scratch resistance or adhesion of various coatings deposited on a single-crystal silicon wafer by nanoindentation and microscratch techniques and friction and wear performance by sliding against a diamond tip and sapphire ball in reciprocating mode. Sic coatings exhibit the highest hardness, about 27 GPa, and the highest elastic modulus, about 255 GPa. Microscratch data indicate that SiC and a-C:H coating exhibit the highest resistance to scratching or debonding from the substrate. During scratching, an A&O, coating deforms like a ductile metal rather than like a ceramic. Si and Co-Nb-Zr coatings exhibit ploughing of the tip into the sample surface and debris generation right in the beginning of the scratch. Sic coatings exhibit the best wear performance against a diamond tip as well as a sapphire ball. For comparisons, we also made mechanical property measurements on bulk materials used in conventional recording: Ni-Zn ferrite, Al,O,-Tic, and Sic (under development). The bulk Ni-Zn ferrite sample was found to be damaged by grain pull-out during scratching even at a low load of 3 mN. Bulk Al,O,-TiC exhibits unexpected ploughing of the sample right from the beginning of the scratch. Bulk Sic did not exhibit any signs of significant damage up to a normal load of about 15 mN. Overall comparison of mechanical properties of bulk materials and coatings suggest that Sic is the most desirable coating in the contact pad for low wear. An Sic coating is also recommended as an overcoat for thin film magnetic disks. Keyword: Contact recording; Nanoindentation; Microscratch

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